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Masked editing with Gemini 2.0 Flash Experimental

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Description

Gemini 2.0 Flash Experimental introduces noticeable artifacts after multiple edits due to its embedding-based editing process, which significantly degrades image quality over time. To counter this, I apply a mask derived from the difference between the input and output images. This approach greatly reduces artifacts in repeated edits and preserves a much cleaner original.

  1. Initial Edit Apply the first edit using Gemini 2.0 Flash Experimental.
  2. Compare Input and Output Generate a difference mask by comparing the original input image with the edited output. This highlights only the changed areas.
  3. Create Mask Use the difference to define a precise edit mask, isolating modified regions.
  4. Apply Masked Edits Feed the mask back into the editing process for subsequent changes. Edits are now localized, preventing unnecessary reprocessing of unchanged areas.
  5. Repeat Edits Carefully Continue editing using masked workflow to minimize quality degradation. This preserves image fidelity across multiple iterations.
  6. Result Cleaner, sharper outputs with fewer artefacts, even after repeated edits.
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Primitive Nodes (5)

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INPAINT_ExpandMask (1)

Image Comparer (rgthree) (1)

polymath_chat (1)

Custom Nodes (9)

ComfyUI

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  • - LoadImage (1)

KJNodes for ComfyUI

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  • - Image Threshold (1)

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